Abrasive liquid for metal and method for polishing

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United States of America Patent

PATENT NO 8491807
APP PUB NO 20120048830A1
SERIAL NO

13218590

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Abstract

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An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

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Patent Owner(s)

  • HITACHI CHEMICAL COMPANY, LTD.;RENESAS ELECTRONICS CORPORATION

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Yoshio Kokubunji, JP 14 169
Hoshino, Tetsuya Tsukuba, JP 24 188
Kamigata, Yasuo Tsukuba, JP 35 245
Kondoh, Seiichi Kokubunji, JP 8 60
Matsuzawa, Jun Hitachi, JP 31 307
Terazaki, Hiroki Tsukuba, JP 24 237
Uchida, Takeshi Tsukuba, JP 118 700

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