Polyimide resin composition, polyimide precursor resin composition for the same, production method thereof, and polyimide film and production method thereof

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United States of America Patent

PATENT NO 8492506
APP PUB NO 20100273974A1
SERIAL NO

12310288

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An object of the present invention, which was made to solve the problems above, is to provide a polyimide precursor resin composition superior in transparency allowing reduction of the residual volatile material rate during molding and giving a polyimide resin composition (e.g., polyimide film) superior in mechanical properties and transparency even when a cheaper polyamide-imide is used. The present invention relates to a polyimide precursor resin composition, comprising a polyamide-imide (A) containing a diamine monomer unit represented by the following formula (1) and a polyamic acid (B) containing at least one kind of monomer unit selected tetracarboxylic acid monomer units represented by the following formulae (2p) to (2r), wherein the haze of the film having a thickness of 40 μm obtained by imidation of the polyimide precursor resin composition is 4% or less:

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Patent Owner(s)

  • UNITIKA LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Echigo, Yoshiaki Kyoto, JP 46 448
Shigeta, Akira Kyoto, JP 30 149
Yoshida, Takeshi Kyoto, JP 276 2243

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