Method of cleaning template and pattern forming method

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United States of America Patent

PATENT NO 8501058
APP PUB NO 20100044921A1
SERIAL NO

12541249

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Abstract

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To remove the resist residue on a template by holding the template with a pattern face having irregularities, supplying a cleaning agent to an area containing the contamination adhering to the pattern face of the template, applying emitted light from the opposite face of the pattern face of the template, and optically exciting the cleaning agent with the emitted light to produce a radical, making at least part of the contamination hydrophilic by reaction of the contamination with the radical, and removing the contamination from the template after hydrophilization.

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Patent Owner(s)

Patent OwnerAddress
KIOXIA CORPORATION1-21 SHIBAURA 3-CHOME MINATO-KU TOKYO

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Shinichi Kanagawa-ken, JP 376 3661

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