Etch resistant gas sensor

United States of America Patent

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Aug 27, 2013
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Apr 9, 2009
app pub date
Dec 12, 2008
filing date
Aug 29, 2007

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Abstract

A gas sensor for sensing chemical gases utilizes a metal oxynitride as the sensing material, which changes its conductivity when exposed to the analyte gas. The change in conductivity is measured for the sensor output. The metal may be either tungsten or molybdenum.

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Patent Owner	Address
APPLIED NANOTECH HOLDINGS INC	3006 LONGHORN BLVD SUITE 107 AUSTIN TX 78758

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G01N:INVESTIGATING OR ANALYSING MATERIALS BY DETERMININ....

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Inventor Name	Address	# of filed Patents	Total Citations
Dass, Ronald I	Austin, US	4	46
Novak, James	Austin, US	23	288

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Etch resistant gas sensor

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12333545

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PATENT NO	8519446
APP PUB NO	20090090170A1
SERIAL NO	12333545
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 27, 2013	US,8519446,B2 US8519446B2	GRANTED PATENT AS SECOND PUBLICATION
April 09, 2009	US,20090090170,A1 US20090090170A1	FIRST PUBLISHED PATENT APPLICATION

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12333545

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