Apparatus for chemical bath deposition between two covers, wherein a cover is a substrate
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United States of America Patent
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Sep 24, 2013
Grant Date -
May 31, 2012
app pub date -
Apr 19, 2011
filing date -
Nov 30, 2010
priority date (Note) -
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Abstract
The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space.
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