Apparatus for chemical bath deposition between two covers, wherein a cover is a substrate

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United States of America Patent

PATENT NO 8539907
APP PUB NO 20120132134A1
SERIAL NO

13090219

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Abstract

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The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTENO 195 SEC 4 CHUNG HSING RD CHUTUNG HSINCHU 31040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Wei-Tse Taoyuan County, TW 21 13
Lan, Chung-Wen New Taipei, TW 31 104
Luo, Yi-Song Tainan, TW 1 4

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