Importance

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Abstract

A multi-layer cross-point memory array comprises one or more word line (WL) layers, one or more bit line (BL) layers interleaved with the one or more WL layers, and a plurality of memory layers, each memory layer disposed between an adjacent WL layer and an adjacent BL layer, and each memory layer including memory elements configured between cross-points of WLs and BLs of the adjacent WL and BL layers. Memory elements in successive memory layers of the memory array are configured with opposing orientations, so that half-selected memory elements arising during times when data operations are being performed on selected memory elements in the memory array are subjected to stress voltages of a polarity of which they are least susceptible to being disturbed. The memory elements can be discrete re-writeable non-volatile two-terminal memory elements that are fabricated as part of a BEOL fabrication process used to fabricate the memory array.

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First Claim