Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium
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United States of America Patent
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Nov 12, 2013
Issued Date -
N/A
app pub date -
Dec 14, 2007
filing date -
Dec 20, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.
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