Extreme ultra violet light source device
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United States of America Patent
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Nov 19, 2013
Grant Date -
Oct 18, 2012
app pub date -
Feb 9, 2012
filing date -
Mar 31, 2006
priority date (Note) -
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Abstract
An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
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