Lithographic apparatus, plasma source, and reflecting method

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United States of America Patent

PATENT NO 8593617
APP PUB NO 20110007292A1
SERIAL NO

12920417

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Abstract

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A lithographic apparatus includes a plasma source that includes a vessel configured to enclose a plasma formation site, an optical device configured to transfer optical radiation to or from the vessel, and a reflector arranged in an optical path between the optical device and the plasma formation site source. The reflector is configured to reflect the optical radiation between the optical device and the plasma formation site. The reflector is formed, in operation, as a molten metal mirror.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Soer, Wouter Anthon Nijmegan, NL 59 251
Van, Herpen Maarten Marinus Johannes Wilhelmus Heesch, NL 136 978

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