Method for applying a diamond layer onto a graphite substrate
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United States of America Patent
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Dec 3, 2013
Grant Date -
Jun 25, 2009
app pub date -
Dec 18, 2008
filing date -
Dec 21, 2007
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Abstract
A diamond layer can be applied stably onto a graphite substrate in a CVD process when the graphite substrate is subjected to the following pretreatment steps before the CVD process:
- fine cleaning of the surface in a vacuum at a temperature >500° C., preferably >800° C., in an etching gas atmosphere,mechanical removal of loose particles,seeding of the substrate surface with very small diamond particles andat least one degassing treatment in a vacuum to remove adsorbed hydrocarbons and adsorbed air at a temperature T>500° C., preferably T>700° C.
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