Method for producing an optical element
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United States of America Patent
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Dec 10, 2013
Grant Date -
May 12, 2011
app pub date -
Jun 25, 2009
filing date -
Jul 11, 2008
priority date (Note) -
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status (Latency Note)
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Abstract
Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta−60° C.), and a material having a glass transition temperature of not less than 290° C. or a glass transition temperature of not less than (Tb−50° C.) is used as the resin material.
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