Group III-nitride layers with patterned surfaces
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United States of America Patent
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Dec 24, 2013
Grant Date -
Feb 2, 2012
app pub date -
Sep 29, 2011
filing date -
Mar 26, 2003
priority date (Note) -
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Abstract
A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.
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