Method for manufacturing solar cell including etching
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United States of America Patent
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Jan 7, 2014
Grant Date -
Jun 14, 2012
app pub date -
Oct 18, 2011
filing date -
Dec 9, 2010
priority date (Note) -
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Abstract
A method for manufacturing a solar cell is presented. The method includes: forming an amorphous silicon layer on a first surface of a light absorbing layer; doping the amorphous silicon layer with a dopant; forming a dopant layer by diffusing the dopant into the amorphous silicon layer with a laser; forming a semiconductor layer by removing the dopant that remains outside the dopant layer; etching the surface of the semiconductor layer by using an etchant; forming a first electrode on the semiconductor layer; and forming a second electrode on a second surface of the light absorbing layer.
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