Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same

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United States of America Patent

PATENT NO 8632952
APP PUB NO 20100027950A1
SERIAL NO

12520898

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Abstract

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Provided are a photosensitive resin composition which is soluble in an alkaline aqueous solution and which has a good propagation loss in a visible light wavelength region, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same.

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Patent Owner(s)

Patent OwnerAddress
HITACHI CHEMICAL COMPANY LTD9-2 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-6606

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Makino, Tatsuya Ibaraki, JP 52 261
Suzumura, Kouji Ibaraki, JP 6 89
Takahashi, Atsushi Ibaraki, JP 443 3708

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