Method for operating a vacuum plasma process system
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United States of America Patent
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Feb 18, 2014
Grant Date -
Feb 21, 2008
app pub date -
Nov 13, 2006
filing date -
Nov 12, 2005
priority date (Note) -
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Abstract
In one aspect, operating a vacuum plasma process system including a plasma discharge chamber is accomplished by generating a main plasma in the discharge chamber in a first operating state, and generating an auxiliary plasma in the discharge chamber in a second operating state. Generating the main plasma includes generating a main plasma power with a first number of RF power generators, and generating an auxiliary plasma power with a second number of RF power generators, such that the second number is smaller than the first number.
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