Conditioner of chemical mechanical polishing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8662956
SERIAL NO

13099401

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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Provided are a conditioner of a chemical mechanical polishing apparatus for polishing a substrate over a platen pad that rotates and a method thereof. The conditioner includes a disk holder, a piston rod, a housing, and a load sensor. The disk holder secures a conditioning disk that finely cuts a surface of the platen pad. The piston rod delivers a normal force to the disk holder. The housing covers at least a portion of the piston rod. The load sensor is installed to receive the normal force that the piston rod delivers to the piston rod and measuring the normal force.

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Patent Owner(s)

  • K.C. TECH CO., LTD.;SAMSUNG ELECTRONICS CO., LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ban, Jnn Ho Gyeonggi-do, KR 1 5
Boo, Jae Phil Gyeonggi-do, KR 19 48
Goo, Ja Cheul Gyeonggi-do, KR 2 12
Jeon, Chan Woon Gyeonggi-do, KR 2 12
Kim, Dong Soo Gyeonggi-do, KR 254 3209
Seo, Keon Sik Gyeonggi-do, KR 3 14

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