Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same

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United States of America Patent

PATENT NO 8663876
APP PUB NO 20120045713A1
SERIAL NO

13201368

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Abstract

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A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide.

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Patent Owner(s)

  • HOYA CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Masahiro Tokyo, JP 98 953
Iwashita, Hiroyuki Tokyo, JP 54 469
Suzuki, Toshiyuki Tokyo, JP 316 3892

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