Method for producing a thin-film solar cell by use of microcrystalline silicon and a layer sequence

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United States of America Patent

PATENT NO 8664522
SERIAL NO

13286359

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Abstract

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A thin film solar cell is disclosed comprising the following layers deposited on a substrate:

    a microcrystalline p- or n-layer,an intermediate microcrystalline silicon i-layer applied by a hot-wire chemical-vapor deposition (HWCVD) method on the microcrystalline p- or n-layer a),an additional i-layer of microcrystalline silicon, which is formed by depositing on the intermediate microcrystalline silicon i-layer, by a plasma enhanced chemical vapor deposition (PECVD), a sputtering process, or a photo-CVD method whereby layers b) and c) together form an i-layer, andif a p-layer is present as the layer of step a), an n-layer, and if an n-layer is present as the layer of step a), a p-layer that is either microcrystalline or amorphous.

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Patent Owner(s)

Patent OwnerAddress
FORSCHUNGSZENTRUM JULICH GMBHWILHELM-JOHNEN-STRASSE JÜLICH 52428

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carius, Reinhard Juelich, DE 6 9
Finger, Friedhelm Juelich, DE 3 4
Klein, Stefan Kahl am Main, DE 28 179
Mai, Yaohua Utrecht, NL 4 2

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