Forming a bridging feature using chromeless phase-shift lithography

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United States of America Patent

PATENT NO 8685597
APP PUB NO 20130089753A1
SERIAL NO

13268285

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Abstract

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First and second anchor features are formed on a photolithography mask, each having a respective center point. An elongated, chromeless, bridging feature is formed between the anchor features. The bridging feature is offset from the center points of the anchor feature to minimize distortions of a corresponding photoresist feature formed by the bridging feature.

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Patent Owner(s)

  • SEAGATE TECHNOLOGY LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Sangho St. Paul, US 77 713
Sullivan, Daniel B Carver, US 14 334

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