Resist composition and method for producing resist pattern

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United States of America Patent

PATENT NO 8685618
APP PUB NO 20130022910A1
SERIAL NO

13552044

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Abstract

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A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I) and (B) an acid generator.

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Patent Owner(s)

  • SUMITOMO CHEMICAL COMPANY, LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ichikawa, Koji Osaka, JP 299 1929
Kamabuchi, Akira Osaka, JP 23 167

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