Method and device for treating a substrate surface of a substrate

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United States of America Patent

PATENT NO 8685864
APP PUB NO 20120234793A1
SERIAL NO

13502648

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Abstract

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In a method for the treatment of a substrate surface of a flat substrate with a process medium at the substrate underside, the process medium has a removing or etching effect on the substrate surface. The substrates are wetted with the process medium from below in a manner lying horizontally. The upwardly facing substrate top side is wetted or covered with water or a corresponding protective liquid over a large area or over the whole area as protection against the process medium acting on the substrate top side.

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Patent Owner(s)

  • GEBR. SCHMID GMBH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Schmid, Christian Freudenstadt, DE 113 584

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