Silicon controlled rectifier structure with improved junction breakdown and leakage control

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United States of America Patent

PATENT NO 8692290
APP PUB NO 20130057991A1
SERIAL NO

13226838

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Abstract

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Device structures and design structures for a silicon controlled rectifier, as well as methods for fabricating a silicon controlled rectifier. The device structure includes first and second layers of different materials disposed on a top surface of a device region containing first and second p-n junctions of the silicon controlled rectifier. The first layer is laterally positioned on the top surface in vertical alignment with the first p-n junction. The second layer is laterally positioned on the top surface of the device region in vertical alignment with the second p-n junction. The material comprising the second layer has a higher electrical resistivity than the material comprising the first layer.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chatty, Kiran V Oviedo, US 59 1294
Gauthier,, Jr Robert J Hinesburg, US 208 2329
Li, Junjun Williston, US 153 1555
Loiseau, Alain Williston, US 71 378

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