Measurement apparatus, exposure apparatus, and device fabrication method
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United States of America Patent
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Apr 8, 2014
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app pub date -
Nov 8, 2010
filing date -
Dec 9, 2009
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Abstract
The present invention provides a measurement apparatus which measures an imaging performance of an optical system to be measured, the apparatus including a first reference substrate which is placed on an object plane of the optical system to be measured, and has periodic patterns arranged in accordance with a plurality of object heights, a second reference substrate which is placed on an image plane of the optical system to be measured, and has apertures which pass light from the periodic patterns, a detection unit configured to detect an intensity of the light which comes from the periodic patterns and has passed through the apertures, a driving unit configured to drive at least one of the first reference substrate and the second reference substrate, and a processing unit configured to perform a process for obtaining the imaging performance of the optical system to be measured.
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