Protection module for EUV lithography apparatus, and EUV lithography apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8698999
APP PUB NO 20110216298A1
SERIAL NO

13041989

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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In EUV lithography apparatuses (10), it is proposed, in order to lengthen the lifetime of contamination-sensitive components, to arrange them in a protection module. The protection module comprises a housing (23-29) having at least one opening (37-47), in which at least one component (13a, 13b, 15, 16, 18, 19) is arranged and at which one or more gas feeds (30-36) are provided in order to introduce a gas flow into the housing (23-29), which emerges through the at least one opening (37-47). In order to effectively prevent contaminating substances from penetrating into the protection module, a light source (48-56) is arranged at the at least one opening (37-47), which light source illuminates the opening (37-47) with one or more wavelengths by which the contaminating substances can be dissociated before they penetrate through the opening (37-47).

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Patent Owner(s)

  • CARL ZEISS SMT GMBH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banney, Ben Augsburg, DE 4 154
Ehm, Dirk Heinrich Lauchheim, DE 48 326
Keller, Franz Stuttgart, DE 3 48
Kugler, Jens Aalen, DE 81 476
Laufer, Timo Stuttgart, DE 20 82
Nieken, Ulrich Neustadt-Hambach, DE 9 42

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