Microchannel plate and its manufacturing method
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United States of America Patent
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May 20, 2014
Grant Date -
Jul 26, 2012
app pub date -
Jul 8, 2010
filing date -
Jul 21, 2009
priority date (Note) -
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Abstract
A microchannel plate (1) having an array of channels (5),includes a substrate (2) and, deposited on the substrate, a hydrogenated amorphous silicon film (3) having a thickness ranging between 50 μm and 200 μm, preferably between 80 μm and 120 μm, the film including the array of channels (5). Preferably, the substrate (2) is an integrated circuit having an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on the substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.
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