Positive resist composition and pattern-forming method using the same

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United States of America Patent

PATENT NO 8741537
APP PUB NO 20060199100A1
SERIAL NO

11366420

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Abstract

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A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same.

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Patent Owner(s)

  • FUJIFILM CORPORATION;FUJI PHOTO FILM CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kanda, Hiromi Shizuoka, JP 50 883

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