Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the mask
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United States of America Patent
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Jun 3, 2014
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app pub date -
May 29, 2013
filing date -
Jul 2, 2012
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Abstract
A mask drawing method includes: disposing a grounding body provided with a grounding pin at a plurality of different places on a mask substrate to measure resistance values; disposing the grounding body at a position where the resistance value is lowest, among the plural positions where the resistance values are measured; and irradiating an electron beam to the mask substrate to draw a desired pattern.
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