Radiation source with cleaning apparatus

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United States of America Patent

PATENT NO 8742381
SERIAL NO

13774612

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Importance

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Abstract

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A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H2, D2 and HD and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the radiation source, to produce hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas, and to supply the hydrogen and/or deuterium radicals and radicals of the one or more additional compounds to the uncapped Mo/Si multilayer mirror to remove at least part of the deposition.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banine, Vadim Yevgenyevich Deurne, NL 222 2857
Jak, Martin Jacobus Johan Eindhoven, NL 74 521
Soer, Wouter Anthon Nijmwegen, NL 59 251
Van, Herpen Maarten Marinus Johannes Wilhelmus Heesch, NL 136 978

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