Method of fabricating nanostructure array and device including nanostructure array

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8758985
APP PUB NO 20120258289A1
SERIAL NO

13198892

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Abstract

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Provided are a method of fabricating a nanostructure array and a device including the nanostructure array. Nanoscale patterning is caused at an interface of a resist layer by light passed through a focusing layer. By such nanoscale patterning, a nanostructure array is fabricated on a substrate in various ways. As the focusing layer, an array of beads or lenses is used, and a pattern of the resist layer may include a nanoscale pore-opening and an undercut structure connected to a lower portion of the opening. The method facilitates adjustment of the size and shape of nanostructures and the interval between the nanostructures. Also, performance of the device including the nanostructure array can be improved. In particular, the method and device result in a sensor having improved sensitivity and reliability optimized for an environment and purpose to be used.

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Patent Owner(s)

  • KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, In Ho Seoul, KR 123 531
Kim, Won Mok Seoul, KR 44 244
Lee, Kyeong Seok Seoul, KR 24 102

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