Replacement gate CMOS
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United States of America Patent
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Jul 1, 2014
Grant Date -
Jul 12, 2012
app pub date -
Mar 22, 2012
filing date -
Mar 19, 2009
priority date (Note) -
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Abstract
A CMOS structure and a method for fabricating the CMOS structure include within a semiconductor substrate a first gate located over a first active region of a first polarity and a second gate located over a second active region of a second polarity different than the first polarity. The first active region and the second active region are separated by an isolation region. The first gate and the second gate are co-linear, with facing endwalls that terminate over the isolation region. The facing endwalls do not have a spacer located or formed adjacent or adjoining thereto, although sidewalls of the first gate and the second gate do. The CMOS structure may be fabricated using a sequential replacement gate method.
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