Air gap formation

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United States of America Patent

PATENT NO 8765573
APP PUB NO 20120070957A1
SERIAL NO

13229673

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Abstract

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A method of forming air gaps between adjacent raised features on a substrate includes forming a carbon-containing material in a bottom region between the adjacent raised features using a flowable deposition process. The method also includes forming a silicon-containing film over the carbon-containing material using a flowable deposition process, where the silicon-containing film fills an upper region between the adjacent raised features and extends over the adjacent raised features. The method also includes curing the carbon-containing material and the silicon-containing material at an elevated temperature for a period of time to form the air gaps between the adjacent raised features.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ingle, Nitin San Jose, US 49 7437
Mallick, Abhijit Basu Palo Alto, US 249 10198

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