Exposure apparatus
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United States of America Patent
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Jul 8, 2014
Grant Date -
Aug 23, 2012
app pub date -
Mar 5, 2012
filing date -
Feb 14, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
In an exposure apparatus employing an over filled optical system, the light quantity distribution on a scanning plane is kept nearly constant for a plurality of scanning light quantities. It selects the light quantity of the light beam irradiated onto the photosensitive body from a plurality of levels, and sets the light quantity selected. According to the light quantity, it selects one of a plurality of correction current profiles, and supplies a light source with a current passing through the correction based on the correction current profile selected. Since the light quantity of the light beam irradiated onto the photosensitive body is corrected by the correction current, the light quantity of the light beam on the photosensitive body becomes nearly constant in the scanning direction.
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