Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus
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United States of America Patent
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Jul 15, 2014
Grant Date -
Oct 10, 2013
app pub date -
Dec 13, 2011
filing date -
Dec 20, 2010
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Abstract
A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.
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