Film forming method, film forming device, liquid crystal arrangement method, liquid crystal arrangement device, liquid crystal device, liquid crystal device production method and electronic equipment

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United States of America Patent

PATENT NO 8780317
APP PUB NO 20090136673A1
SERIAL NO

12356738

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A film forming device forms a coated film on a substrate by discharging a liquid material in the form of liquid droplets, and causing the liquid droplets to impact on the substrate at a predetermined pitch. The predetermined pitch is determined based on the diameter of the liquid droplets after impact of the liquid droplets on the substrate. Drop marks are reduced and a uniform coated film is formed on the substrate.

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Patent Owner(s)

  • SEIKO EPSON CORPORATION

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hiruma, Kei Chino, JP 52 145

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