Mask and method for fabricating semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8790851
APP PUB NO 20130252429A1
SERIAL NO

13569860

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Abstract

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A photo mask for exposing according to an embodiment includes a mark pattern arranged in a mark region that is different from an effective region to form a semiconductor device; and a regular pattern arranged in the mark region and around the mark pattern and smaller than the mark pattern in size and pitch.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishigo, Kazutaka Mie, JP 12 74
Kuriyama, Taketo Mie, JP 5 17
Okamoto, Yosuke Mie, JP 28 149

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