Charged particle beam writing apparatus and charged particle beam writing method
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United States of America Patent
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Jul 29, 2014
Grant Date -
Jun 13, 2013
app pub date -
Dec 6, 2012
filing date -
Dec 7, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The aperture plate has a stacked structure of a first member and a second member, and a position of an end portion of the first opening portion in the second member is recessed from the position of the end portion of the first opening portion in the first member.
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