Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition

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United States of America Patent

PATENT NO 8795944
APP PUB NO 20110318687A1
SERIAL NO

13139193

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Abstract

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Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirano, Shuji Shizuoka, JP 69 301
Iizuka, Yusuke Shizuoka, JP 23 92
Iwato, Kaoru Shizuoka, JP 69 420
Saegusa, Hiroshi Shizuoka, JP 75 496

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