System for removing vapors from a liquid tank as the liquid tank is filled with fluid from a fluid source
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United States of America Patent
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Aug 12, 2014
Grant Date -
N/A
app pub date -
Jul 27, 2011
filing date -
Feb 6, 2008
priority date (Note) -
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Abstract
A system for removing unwanted contaminates from gases using a scrubber, which comprises a housing, a reaction chamber having a liquid level, an inlet connected to a source containing gases to be scrubbed with a contamination concentration greater than zero ppb to saturation. A gas exit port connected to the housing is used for evacuating scrubbed gas and a sintered permeable membrane is disposed across the reaction chamber, which provides a reaction zone in the plurality of pores when gases to be scrubbed are introduced to the membrane on a first side while the membrane is immersed in the lean liquid; and a cleaned gas on a second side wherein the clean gas initially has a drop in contamination concentration of at least 99 percent and gradually decreasing to 70 percent as additional gases to be scrubbed are introduced to the plurality of pores without replacing the lean liquid.
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