Method and apparatus for dressing polishing pad
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United States of America Patent
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Aug 19, 2014
Grant Date -
Dec 22, 2011
app pub date -
Jun 20, 2011
filing date -
Jun 21, 2010
priority date (Note) -
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status (Latency Note)
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Abstract
The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life of the polishing pad. The method for dressing a polishing pad, which has been used to polish a surface of a work by pressing the work onto the polishing pad fixed on a polishing plate with supplying slurry thereto, by using a grind stone, comprises the steps of: cleaning the polishing pad by supplying high-pressure cleaning water to the polishing pad; and dressing the polishing pad by moving a dressing grind stone, in the radial direction of the polishing pad, along a surface profile thereof, while performing the cleaning step.
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