Composition, resist film, pattern forming method, and inkjet recording method

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United States of America Patent

PATENT NO 8808961
APP PUB NO 20110102528A1
SERIAL NO

12914762

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Abstract

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An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Takayuki Shizuoka, JP 444 4983
Kawabata, Takeshi Shizuoka, JP 104 1210
Tsuchimura, Tomotaka Shizuoka, JP 102 600

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