Exposure apparatus and article manufacturing method
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United States of America Patent
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Aug 19, 2014
Grant Date -
Dec 22, 2011
app pub date -
Jun 10, 2011
filing date -
Jun 16, 2010
priority date (Note) -
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status (Latency Note)
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Abstract
An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.
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