Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical system

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United States of America Patent

PATENT NO 8811714
APP PUB NO 20120051622A1
SERIAL NO

13217558

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Abstract

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The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cutline used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target position of the image, and a step of determining an intensity of an element light source such that the position of a midpoint between edges of the image of the pattern of the mask on the cutline from a calculated image comes close to the target position, thereby determining the light intensity distribution.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukagawa, Youzou Utsunomiya, JP 18 185
Gyoda, Yuichi Utsunomiya, JP 26 122
Ishii, Hiroyuki Shioya-gun, JP 503 6259
Mikami, Koji Nikko, JP 54 403

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