Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter

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United States of America Patent

PATENT NO 8817237
APP PUB NO 20120154778A1
SERIAL NO

13392434

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Abstract

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A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dekker, Ronald Valkenswaard, NL 121 1486
Jak, Martin Jacobus Johan Eindhoven, NL 74 524
Soer, Wouter Anthon Nijmegen, NL 59 251

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