Dual mandrel sidewall image transfer processes

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United States of America Patent

PATENT NO 8828876
APP PUB NO 20140190935A1
SERIAL NO

13737099

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Abstract

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A combination of two lithographically patterned mandrels can be employed in conjunction with sidewall spacers to provide two spacers. The two spacers may intersect each other and/or contact sidewall surfaces of each other to provide a thickness that is a sum of the thicknesses of the two spacers. Further, the two spacers may be patterned to provide various patterns. In addition, portions of at least one of the two spacers may be etched employing an etch mask. Additionally or alternately, an additional material may be selectively added to portions of one of the two spacers.

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Patent Owner(s)

Patent OwnerAddress
GLOBALFOUNDRIES U S INC400 STONEBREAK ROAD EXTENSION MALTA NY 12020

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Horak, David V Essex Junction, US 328 8080
Koburger,, III Charles W Delmar, US 105 1693
Ponoth, Shom Clifton Park, US 241 3779
Yang, Chih-Chao Glenmont, US 1081 8220

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