Polymer and photosensitive resin composition comprising the same

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United States of America Patent

PATENT NO 8829068
APP PUB NO 20130030077A1
SERIAL NO

13452456

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.

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Patent Owner(s)

  • LG CHEM, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Changho Anseong-si, KR 8 28
Choi, Dongchang Daejeon, KR 7 41
Chung, Won Jin Daejeon, KR 7 39
Heo, Yoon Hee Daejeon, KR 12 47
Ji, Ho Chan Daejeon, KR 8 57
Kim, Han Soo Daejeon, KR 78 308
Kim, Sunhwa Daejeon, KR 26 62

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