Photosensitive composition and compound for use in the photosensitive composition

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United States of America Patent

PATENT NO 8835521
APP PUB NO 20130029271A1
SERIAL NO

13549753

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Abstract

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Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern.

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Patent Owner(s)

  • LG CHEM, LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Keon Woo Daejeon, KR 19 84

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