Method for contamination removal using magnetic particles

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United States of America Patent

PATENT NO 8845812
APP PUB NO 20100313907A1
SERIAL NO

12483518

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Abstract

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Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from a surface of the substrate.

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Patent Owner(s)

  • MICRON TECHNOLOGY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kramer, Steve Boise, US 26 1092
Sandhu, Gurtej Boise, US 243 7795
Sinha, Nishant Boise, US 168 2087

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