Reticles, and methods of mitigating asymmetric lens heating in photolithography
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 30, 2014
Grant Date -
Mar 1, 2012
app pub date -
Aug 24, 2010
filing date -
Aug 24, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imagable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imagable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imagable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully