Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate
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United States of America Patent
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Sep 30, 2014
Grant Date -
Dec 5, 2013
app pub date -
Jun 4, 2012
filing date -
Jun 4, 2012
priority date (Note) -
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Abstract
A photomask includes a substrate having a device region and an adjacent edge region over transparent material. The device region includes spaced primary features of constant pitch at least adjacent the edge region. The edge region includes spaced sub-resolution assist features of the constant pitch of the spaced primary features at least adjacent the device region and which are off-phase by from about 30° to about 150° from +/−180°. Additional embodiments, including methods, are disclosed.
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