Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

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United States of America Patent

PATENT NO 8846290
APP PUB NO 20120015302A1
SERIAL NO

13260777

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Abstract

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An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Mitsuhiro Kanagawa, JP 42 455
Kataoka, Shohei Shizuoka, JP 39 195
Shibuya, Akinori Shizuoka, JP 81 333
Shirakawa, Michihiro Shizuoka, JP 85 217
Tango, Naohiro Shizuoka, JP 29 61
Yamaguchi, Shuhei Shizuoka, JP 89 365

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